4.7 DRY DEPOSITION


        The dry deposition rate is computed using a total resistance (Rijk) as shown in Equation 63. The total resistance, the inverse of the deposition velocity, is computed at each point as the sum of atmospheric and surface resistances:

(62)


where  
         The atmospheric resistance represents the resistance for the transfer of a contaminant in the atmospheric layer to the ground surface. The atmospheric resistance varies with the wind speed, stability, and upwind surface roughness using micrometeorological relationships (Paulson 1970; Businger et al. 1971; Golder 1972). The surface resistance is a function of the surface roughness and the properties of the materials. For particulate matter, the gravitational term is included in the empirical curves used to define the resistances (Sehmel and Hodgson 1978).

Dry deposition is based on the computed near-surface air concentrations given in Equation 48 using

(63)


where
          A mass budget approach is used to compute the net Gaussian plume source depletion fractions (i.e., parameter d in Equation 49) for dry deposition. Although these removal rates are applied as a source depletion model (see Equation 48) such as the one given in Slade (1968), the surface depletion effects documented by Horst (1984) are accounted for in the MEPAS dry deposition model by the atmospheric resistances. The approach computes deposition resistances for each wind speed/stability class over a layer that is deep enough so that corrections for near-surface concentration depletion are unnecessary. The thickness of this layer is assumed to be 10 m. The computation of the atmospheric resistance term is based on assuming empirical shapes of micrometeorological profiles. The atmospheric resistance varies with stability, wind speed, and local surface roughness.