Comprehensive Chemical Exposure Framework

Title Page

1.0 Introduction

2.0 Literature Review

3.0 Model Framework

4.0 Scenarios
4.1 Life Stages
4.2 Scenario 1
    Model Flow Diagram 1
4.3 Scenario 2
    Model Flow Diagram 2
4.4 Scenario 3
    Model Flow Diagram 3
4.5 Scenario 4
    Model Flow Diagram 4
4.6 Process Flow
4.7 Gap Analysis

5.0 Qualitative Analysis

6.0Recommendations

7.0 References

Appendix A

The following Scenario 3 Process Flow Diagram illustrates
the mapping between the models and the process numbers.
Select a model or model description from the table below (ordered alphabetically),
and the corresponding processes on the diagram will be highlighted.
Scenario 3
CONTAMW
Dust resuspension
indoor smoke emission
Partitioning between vapor and particle phase
PBPD for adult male
PBPK for adult male
PROMISE
THERdbASE
VOC fugitive emissions from mixing vessel

Figure 4.6.11 Scenario 3 Process Framework: Occupational exposure of VOC Compound Group D (benzene, toluene, n-hexane) to adult male compounding solvent-based adhesive


Notes

  • Compound D: Benzene, Toluene, n-Hexane
  • Metabolite: Combination of Phenol & Hydroquinone
  • Mode of Action: Bone Marrow
  • The combination of the three VOC’s produce the health effects of concern.
  • Data gaps: No models for #3 VOC fugitive emissions from mixing vessel, #6 partitioning between vapor and particle phases (air conc.), #11 particle resuspension from surfaces (especially floors), #17 VOC from mainstream smoking (may be able to use something from review article on smoking release from website http://ehpnet1.niehs.nih.gov/docs/1999/Suppl-2/375-381ott/abstract.html)
  • Dr. John Little and others at Virginia Tech in Blacksburg, VA have developed diffusion algorithms for VOCs that may be an improvement over existing models for diffusion-controlled release in process #1 and the reversible, diffusive sink effect for processes #6, #7, & #8. Papers describing these algorithms have recently been accepted in the journals "Indoor Air" and " Environmental Science & Technology". Dr. Little's e-mail address is jcl@vt.edu.

Return to Process Framework list.